硬掩模Hard Mask (HM)
Novel Spin-on Carbon Hardmasks
Semiconductor Process Materials|Semiconductor material: etc
Nanomaterials | Free Full-Text | Surface Transformation of Spin-on-Carbon Film via Forming Carbon Iron Complex for Remarkably Enhanced Polishing Rate
Electronics | Free Full-Text | Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask
생생한 반도체 이야기 – 미세패터닝 기술의 한계를 넘는 더블 패터닝 기술(2) — Steemit
Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication | Scientific Reports
Figure 5 from Aluminum oxide hard mask fabrication by focused ion beam implantation and wet etching | Semantic Scholar
Microwaves101 | Photolithography 101
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Micromachines | Free Full-Text | A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
Fullerene-based spin-on-carbon hardmask - ScienceDirect
Shrinking Feature Size: Light Sources to OPC - An Introduction to Semiconductor Physics, Technology, and Industry
Use of oxide hard mask for patterning low-κ dielectric. | Download Scientific Diagram
Low Stress TiN as Metal Hard Mask for Advance Cu-Interconnect
OptiStack® Multilayer Lithography | Brewer Science
28nm Metal Hard Mask etch process development | Semantic Scholar
The investigation of DARC etch back in DRAM capacitor oxide mask opening
Sublithographic patterning technology: photoresist ashing-hard mask... | Download Scientific Diagram
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Photomask
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
